V.I.E. - PLM Solution Architect
Pubblicato il 06-10-2026 - Capgemini in Italia
Choosing Capgemini means choosing a company where you will be empowered to shape your career in the way you’d like, where you’ll be supported and inspired by a collaborative community of colleagues around the world, and where you’ll be able to reimagine what’s possible.
Si candidi tempestivamente È previsto un elevato volume di candidati per il ruolo descritto di seguito, non aspetti a inviare il suo CV.
Join Capgemini Italy and contribute to the digital transformation of engineering and product development environments for leading industrial organizations.
As part of our Intelligent Industry and Digital Engineering practice, you will support the design and evolution of Product Lifecycle Management (PLM) solutions based on leading platforms such asDassault Systèmes 3DEXPERIENCE, PTC Windchill or Siemens Teamcenter.
Working in an international and multicultural environment, you will collaborate with engineering, manufacturing,ITand business stakeholders to help clients improve collaboration, product innovation,traceabilityand digital continuity across the entire product lifecycle.
Location:Milan or Turin, Italy
Your role
As a PLM Solution Architect, you will:
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- Contribute to the design and evolution of PLM solutions supporting engineering and manufacturing transformation programs
- Support business and technical workshops to understand customer requirements and translate them into solution designs
- Participate in solution architecture activities across product development, engineering,manufacturingand change management domains
- Contribute to integration design between PLM platforms and enterprise systems such as ERP,MESand CAD applications
- Support data governance, product structure, configurationmanagementand engineering change processes
- Participate in deployment,testingand continuous improvement initiatives
- Contribute to architecture documentation, best practices and knowledge sharing across project teams
Your profile
This position requires prior ha